Micromachines | Free Full-Text | Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation
ArF Excimer Laser for 193nm Lithography | Ushio's technology periodical, "Light Edge" | USHIO INC.
a) PLD set-up inside the high vacuum chamber. A pulsed excimer laser... | Download Scientific Diagram
Experimental studies on ablation characteristics of alumina after irradiation with a 193-nm ArF excimer laser | SpringerLink